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3M™ Novec™ Electronic Surfactants

3M™ Novec™ Electronic Surfactants
3M™ Novec™ Electronic Surfactants are low-metal surfactants, used to reduce surface tensions and improve the wet-out, leveling and flow-control characteristics of a variety of process fluids and coatings.

For example, in the semiconductor industry they are used to improve penetration of metal etch solutions, and other aqueous microelectronic process chemicals, such as low pH solutions. They are also used as wetting agents in photoresists, photoresist strippers, edge bead removers, anti-reflective coating and spin-on glass films.

Novec electronic surfactants are formulated using a sustainable chemistry. In addition, they offer excellent solubility for easy mixing, are low in metals content, and can withstand continuous filtration.

Features and Benefits

  • Effective in low concentrations
  • Little or no effect on the etch rate
  • Low foaming
  • Filterable
  • Limited surface adsorption


    • 3M™ Novec™ 4200 Electronic Surfactants

    Anionic fluorochemical surfactant in water, 25% active. Can be used in BOE, aqueous solutions.

    3M™ Novec™ 4300 Electronic Surfactants

    Anionic Fluorochemical Surfactant in glacial acetic acid, 20% active: Suitable for use in metal etch, and provides low surface tension in a variety of aqueous solutions for electronic processing.

    Technical Data Sheet

    3M™ Novec™ 4200 Electronic Surfactant (PDF 85.0 kB)

    3M™ Novec™ 4300 Electronic Surfactant (PDF 101.0 kB)

    Surface Tension Reduction for Semiconductor Process Fluids
    3M Novec Electronic Surfactants are used in semiconductor manufacturing as wetting agents to improve penetration of etchants, coatings or strippers into very narrow trenches and other small features. They are effective at low concentrations, and are capable of withstanding continuous filtration, to help extend etch bath life. Learn more about Electronic Surfactants for surface tension reduction

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